PRODUCTS CENTER
North Korea Wafer Defect Inspection Machine
It is specially designed for the detection of nano-scale defects, and can detect the particle size of 0.1um. It also includes an image re-inspection system; EFEM OCR/Pre-Aligner is optional.
Category:
Product Description




|
Project |
Specification |
|
Resolution |
0.1um |
|
WPH |
6 inches 3 minutes/piece |
|
Laser |
405nm or 532nm |
|
Compatibility |
4, 6, 8 Inches |
|
Defect image |
High resolution |
Wafer/Epiwafer Appearance Inspection; Corresponding Process: After Polishing/Thinning: Particle counter, Crack inspection, Haze inspection, Microscope viewer
Contact:17715518125
-
E-mail:Sales@hb-gmose.com
Fax:0512-65308125 -
Address: Room 303, Building 1, No. 3 Xialita Road, Mudu Town, Wuzhong District, Suzhou
Scan to follow us
Copyright ©2022 Jiangsu Hanbo Intelligent Equipment Manufacturing Co., Ltd.