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Kazakhstan Wafer Defect Inspection Machine

It is specially designed for the detection of nano-scale defects, and can detect the particle size of 0.1um. It also includes an image re-inspection system; EFEM OCR/Pre-Aligner is optional.

Product Description

 

Project

Specification

Resolution

0.1um

WPH

6 inches 3 minutes/piece

Laser

405nm or 532nm

Compatibility

4, 6, 8 Inches

Defect image

High resolution
Interference microscope

 

Wafer/Epiwafer Appearance Inspection; Corresponding Process: After Polishing/Thinning: Particle counter, Crack inspection, Haze inspection, Microscope viewer